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Zeneca Ltd 1 m hf
1 M Hf, supplied by Zeneca Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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Zeneca Ltd 1 m hf
(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M <t>NH</t> <t>4</t> <t>HF</t> <t>2</t> for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).
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(a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M NH 4 HF 2 for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).

Journal: Chemistry of Materials

Article Title: Transparent Conductive Two-Dimensional Titanium Carbide Epitaxial Thin Films

doi: 10.1021/cm500641a

Figure Lengend Snippet: (a) XRD patterns of as-deposited −60 nm nominal thickness - Ti 3 AlC 2 thin films (I), Ti 3 C 2 T x after etching in 50% HF for 2 h 40 min (II), and Ti 3 C 2 T x -IC after etching in 1 M NH 4 HF 2 for 11 h (III). XPS spectra of, (b) Ti 2p, (c) C 1s, and (d) Al 2p for Ti 3 AlC 2 , Ti 3 C 2 T x , and Ti 3 C 2 T x -IC thin films, respectively. The vertical lines in panels b and c indicate the positions of Ti (3/2p and 1/2p) and C (1s) binding energies in TiC, respectively. (e) High resolution XPS spectra for N 1s region for Ti 3 C 2 T x -IC, best fitted by symmetric Gaussian–Lorentzian curves resting on a Shirley background. The two components correspond to (NH 4 +1 ) and (NH 3 ).

Article Snippet: The second was 1 M NH 4 HF 2 (Sigma Aldrich, Stockholm, Sweden).

Techniques: Binding Assay